Investigation of resist filling behavior in microimprint lithography by CFD simulation and defocusing digital particle image velocimetry[J]
发布时间：2025-04-30
点击次数：
- 发布时间：
- 2025-04-30
- 论文名称：
- Investigation of resist filling behavior in microimprint lithography by CFD simulation and defocusing digital particle image velocimetry[J]
- 发表刊物：
- Journal of Vacuum Science & Technology B.
- 摘要：
- Jun DU, Zhengying WEI, Shize LI, et al. Investigation of resist filling behavior in microimprint lithography by CFD simulation and defocusing digital particle image velocimetry[J]. Journal of Vacuum Science & Technology B. 2013, 31 (2) 021601-1.（SCI:JVTBD9, IF:1.355, EI:20131516190757）
- 合写作者：
- Jun DU, Zhengying WEI, Shize LI, et al
- 卷号：
- 2013, 31 (2)
- 页面范围：
- 021601-1
- 是否译文：
- 否
- 发表时间：
- 2013-02-19