Effects of Mold Geometries and Initial Resist Thickness on Filling Behavior in UV-Nanoimprint Lithography[J].
发布时间：2025-04-30
点击次数：
- 发布时间：
- 2025-04-30
- 论文名称：
- Effects of Mold Geometries and Initial Resist Thickness on Filling Behavior in UV-Nanoimprint Lithography[J].
- 发表刊物：
- Journal of Computational and Theoretical Nanoscience,
- 摘要：
- Du J, Wei Z, He W, et al. Effects of Mold Geometries and Initial Resist Thickness on Filling Behavior in UV-Nanoimprint Lithography[J]. Journal of Computational and Theoretical Nanoscience, 2012, 9 (8): 1029-1035. （SCI:979ZB, IF:0.912, EI:20123015271252）
- 合写作者：
- Du J, Wei Z, He W, et al.
- 卷号：
- 2012, 9 (8)
- 页面范围：
- 1029-1035
- 是否译文：
- 否
- 发表时间：
- 2012-08-15