Resist deformation and flow fields in microimprint lithography[J]
发布时间：2025-04-30
点击次数：
- 发布时间：
- 2025-04-30
- 论文名称：
- Resist deformation and flow fields in microimprint lithography[J]
- 发表刊物：
- Journal of Micromechanics and Microengineering
- 摘要：
- DU Jun, WEI Zhengying, LI Shize and TANG Yiping. Resist deformation and flow fields in microimprint lithography[J]. Journal of Micromechanics and Microengineering, 2013, 23 (5): 055026. （SCI:128AA, IF:2.313, EI: 20132216379240）
- 合写作者：
- DU Jun, WEI Zhengying, LI Shize and TANG Yiping
- 卷号：
- 2013, 23 (5):
- 页面范围：
- 055-026
- 是否译文：
- 否
- 发表时间：
- 2013-05-20
- 上一条：Analysis on the Lubrication Performances of Journal Bearing System Using Computational Fluid Dynamics and Fluid–Structure Interaction Considering Thermal Influence and Cavitation[J]
- 下一条：Investigation of resist filling behavior in microimprint lithography by CFD simulation and defocusing digital particle image velocimetry[J]