Reverse Nonequilibrium Molecular Dynamics Calculation of the Resist Shear Viscosity in UV-Nanoimprint Lithography[J].
发布时间：2025-04-30
点击次数：
- 发布时间：
- 2025-04-30
- 论文名称：
- Reverse Nonequilibrium Molecular Dynamics Calculation of the Resist Shear Viscosity in UV-Nanoimprint Lithography[J].
- 发表刊物：
- Journal of Computational and Theoretical Nanoscience
- 摘要：
- Du Jun, WEI Zhengying, TANG Yiping. Reverse Nonequilibrium Molecular Dynamics Calculation of the Resist Shear Viscosity in UV-Nanoimprint Lithography[J]. Journal of Computational and Theoretical Nanoscience, 2013, 10 (1) 208-212. （SCI:082DO, IF:0.912, EI: 20131816282867）
- 合写作者：
- Du Jun, WEI Zhengying, TANG Yiping.
- 卷号：
- 2013, 10 (1)
- 页面范围：
- 208-212.
- 是否译文：
- 否
- 发表时间：
- 2013-10-14