Visualization of resist flow fields in microlithography by using defocusing digital particle image velocimetry[J]
发布时间：2025-04-30
点击次数：
- 发布时间：
- 2025-04-30
- 论文名称：
- Visualization of resist flow fields in microlithography by using defocusing digital particle image velocimetry[J]
- 发表刊物：
- Journal of Micro/Nanolithography,
- 摘要：
- Du Jun, Wei Zhengying, Li Shize, Tang Yiping. Visualization of resist flow fields in microlithography by using defocusing digital particle image velocimetry[J]. Journal of Micro/Nanolithography, MEMS, and MOEMS. 12 (3), 033004 (July 11, 2013); doi:
- 合写作者：
- Du Jun, Wei Zhengying, Li Shize, Tang Yiping.
- 卷号：
- MEMS, and MOEMS. 12 (3)
- 页面范围：
- 033004 (July 11, 2013)
- 是否译文：
- 否
- 发表时间：
- 2013-07-11
- 上一条：Reverse Nonequilibrium Molecular Dynamics Calculation of the Resist Shear Viscosity in UV-Nanoimprint Lithography[J].
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