Investigation of resist filling behavior in microimprint lithography by CFD simulation and defocusing digital particle image velocimetry[J]
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2025-04-30Title of Paper:
Investigation of resist filling behavior in microimprint lithography by CFD simulation and defocusing digital particle image velocimetry[J]Journal:
Journal of Vacuum Science & Technology B.Summary:
Jun DU, Zhengying WEI, Shize LI, et al. Investigation of resist filling behavior in microimprint lithography by CFD simulation and defocusing digital particle image velocimetry[J]. Journal of Vacuum Science & Technology B. 2013, 31 (2) 021601-1.（SCI:JVTBD9, IF:1.355, EI:20131516190757）Co-author:
Jun DU, Zhengying WEI, Shize LI, et alVolume:
2013, 31 (2)Page Number:
021601-1Translation or Not:
NoDate of Publication:
2013-02-19