Resist deformation and flow fields in microimprint lithography[J]
- Release Time:2025-04-30
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Date:
2025-04-30Title of Paper:
Resist deformation and flow fields in microimprint lithography[J]Journal:
Journal of Micromechanics and MicroengineeringSummary:
DU Jun, WEI Zhengying, LI Shize and TANG Yiping. Resist deformation and flow fields in microimprint lithography[J]. Journal of Micromechanics and Microengineering, 2013, 23 (5): 055026. （SCI:128AA, IF:2.313, EI: 20132216379240）Co-author:
DU Jun, WEI Zhengying, LI Shize and TANG YipingVolume:
2013, 23 (5):Page Number:
055-026Translation or Not:
NoDate of Publication:
2013-05-20
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