Effects of Mold Geometries and Initial Resist Thickness on Filling Behavior in UV-Nanoimprint Lithography[J].
- Release Time:2025-04-30
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Date:
2025-04-30Title of Paper:
Effects of Mold Geometries and Initial Resist Thickness on Filling Behavior in UV-Nanoimprint Lithography[J].Journal:
Journal of Computational and Theoretical Nanoscience,Summary:
Du J, Wei Z, He W, et al. Effects of Mold Geometries and Initial Resist Thickness on Filling Behavior in UV-Nanoimprint Lithography[J]. Journal of Computational and Theoretical Nanoscience, 2012, 9 (8): 1029-1035. （SCI:979ZB, IF:0.912, EI:20123015271252）Co-author:
Du J, Wei Z, He W, et al.Volume:
2012, 9 (8)Page Number:
1029-1035Translation or Not:
NoDate of Publication:
2012-08-15