Pulsed laser deposition of epitaxial ferroelectric Pb(Zr,Ti)O3 films on silicon substrates
发布时间：2025-04-30
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- 发布时间：
- 2025-04-30
- 论文名称：
- Pulsed laser deposition of epitaxial ferroelectric Pb(Zr,Ti)O3 films on silicon substrates
- 发表刊物：
- Thin Solid Films
- 摘要：
- We report on the epitaxial growth and electrical properties of Pb0.52Zr0.48TiO3 (PZT) thin films deposited by Pulsed Laser Deposition (PLD) on SrTiO3 (STO)-buffered Si(001). Previously to PZT growth, 40nm-thick (La,Sr)MnO3 (LSMO) layer was deposited to serve as electrical bottom electrode. The 200nm-thick PZT film epitaxy was optimized by PLD on STO-buffered Si(001).The high contrast of stable artificially poled ferroelectric surfaces evidences the good ferroelectric properties of the PZT thin film. The structural as well as the physical properties of the PZT/LSMO/STO/Si(001) structure prove that very good quality layers have been obtained for films grown on silicon substrate.
- 合写作者：
- A.S. Borowiak · G. Niu · V. Pillard · [...]
- 是否译文：
- 否
- 发表时间：
- 2012-05-01