Reverse Nonequilibrium Molecular Dynamics Calculation of the Resist Shear Viscosity in UV-Nanoimprint Lithography[J].
- Release Time:2025-04-30
- Hits:
Date:
2025-04-30Title of Paper:
Reverse Nonequilibrium Molecular Dynamics Calculation of the Resist Shear Viscosity in UV-Nanoimprint Lithography[J].Journal:
Journal of Computational and Theoretical NanoscienceSummary:
Du Jun, WEI Zhengying, TANG Yiping. Reverse Nonequilibrium Molecular Dynamics Calculation of the Resist Shear Viscosity in UV-Nanoimprint Lithography[J]. Journal of Computational and Theoretical Nanoscience, 2013, 10 (1) 208-212. （SCI:082DO, IF:0.912, EI: 20131816282867）Co-author:
Du Jun, WEI Zhengying, TANG Yiping.Volume:
2013, 10 (1)Page Number:
208-212.Translation or Not:
NoDate of Publication:
2013-10-14