Visualization of resist flow fields in microlithography by using defocusing digital particle image velocimetry[J]
- Release Time:2025-04-30
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Date:
2025-04-30Title of Paper:
Visualization of resist flow fields in microlithography by using defocusing digital particle image velocimetry[J]Journal:
Journal of Micro/Nanolithography,Summary:
Du Jun, Wei Zhengying, Li Shize, Tang Yiping. Visualization of resist flow fields in microlithography by using defocusing digital particle image velocimetry[J]. Journal of Micro/Nanolithography, MEMS, and MOEMS. 12 (3), 033004 (July 11, 2013); doi:Co-author:
Du Jun, Wei Zhengying, Li Shize, Tang Yiping.Volume:
MEMS, and MOEMS. 12 (3)Page Number:
033004 (July 11, 2013)Translation or Not:
NoDate of Publication:
2013-07-11
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