The major publications:
1.Yu Luo,Shuyi Liu,Nilesh Barange,Li Wang*,Franky So.Perovskite Solar Cells on Corrugated Substrates with Enhanced Efficiency.Small,in press,DOI:10.1002/small.201601974(SCI:,IF:8.5);
2. Yu Luo, Li Wang*, Xiaonan Yang, Hui Duan, Wei Liu. Enhanced light extraction and tunable chromaticity in white organic light emitting devices with znonanopillars. Appied Optics Letters, 2016,3(7)（ SCI：， IF：3.2）
3.Xiuqing Hao , Guang Wu, Li Wang, Danhui Lv , Yu Luo , Liang Li , Ning He .Superhydrophobic surfaces based on ZnO-constructed hierarchical architectures.Microelectronic Engineering 141 (2015) 44–50（ SCI：， IF：1.277）;
4.Hao X, Pei S, Wang L*, et al. Microtexture fabrication on cylindrical metallic surfaces and its application to a rotor bearing system[J]. The International Journal of Advanced Manufacturing Technology, 2014: 1-9（ SCI：， IF：1.779）
5.Wang Li*, Wang Quandai, Yan Chengping, Duan Hui, Lv Danhui, Ding Yucheng.Experimental Research and Comparison on Tribological Properties of Bronze substrate with Different Surface Wettability，October 26-28,Chicago,STLE 2014[C]
6. Yu Luo, Li Wang*, Yucheng Ding, Long Li, Bin Wei, Jianhua Zhang. Flexible OLED with enhanced light outcoupling efficiency fabricated on doubleside nanotextured substrate. ACS Applied materials & interfaces[J] 2014, 6 (13),10213–10219 （ SCI IDS：AU6OF， IF：5.900）
7. Li XM ,Wang CH , Shao JY, Ding YC , Tian, HM, Wang, L. Periodic Parallel Array of Nanopillars and Nanoholes Resulting from Colloidal Stripes Patterned by Geometrically Confined Evaporative Self-Assembly for Unique Anisotropic Wetting,ACS APPLIED MATERIALS & INTERFACES[J] 2014,6(22) 20300-20308(SCI IDS: AU6OF IF=5.9)
8.Jiang CB , Li, XM, Tian, HM , Shao JY，Wang L . Lateral Flow through a Parallel Gap Driven by Surface Hydrophilicity and Liquid Edge Pinning for Creating Microlens Array,ACS APPLIED MATERIALS & INTERFACES 2014,6(21) 18450-18456 (SCI IDS: AU6OF IF:5.9)
9.Li XM ,Tian HM , Wang CH, Li X, Shao JY, Ding YC , Wang L.Electrowetting Assisted Air Detrapping in Transfer Micromolding for Difficult-to-Mold Microstructures,ACS APPLIED MATERIALS &
10.Yu Luo, Li Wang, Yucheng Ding, Long Li, High lightextracting efficiency for OLED
11.Traor Moussa Magara, Wang Li, Influences of the Flow Speed and the Micro-Texture Deepness on the Hydrodynamic Lubrication Characteristics, Journal of Computational and Theoretical Nanoscience, 10(2), pp 419-422, 2013/2.(SCI: 101BA)
12.Yu Luo,Li Wang*,Yucheng Dinga, Huifen Wei , Dongdong Wang, etal. Direct fabrication of microlens arrays with high numerical aperture by ink-jetting on nanotextured surface, Applied Surface Science, 2013 (279):36-40.(SCI: 101BA)
13.Wang Li*, Wang Quandai,Hao Xiuqing,etal.Finite element simulation and experimental study on the through-mask electrochemical micromachining (EMM ) process；International Journal of Advanced Manufacturing；2010 (51)1:155–162（SCI：666SX）
14.Xiuqing Hao, Li Wang*,Quandai Wang, Fangliang Guo, etal. Surface micro-texturing of metallic cylindrical surface with proximity rolling-exposure lithography and electrochemical micromachining, Applied Surface Science, Ｖ257（2011）, 8906-8911 (SCI: 789TR)
15.Li Wang*, Wei Xu, Yu Luo etal. Performances enhancement in OLEDs by inserting ultrathin trilayer in electron injection structure and using MoO3 as hole buffer layer,Displays,2011,(32)1:45-48(SCI:717VN)
16.Xiuqing Hao, Li Wang*,Yucheng Ding, etal. Finite Element Analysis of a maskless electrochemical strcturing(MECS) method, Adv. Sci. Lett., 2011, 4:1394-1398
17.Wang Li*, Wang Quandai, Hao Xiuqing, etal.Finite element simulation and experimental study on the through-mask electrochemical micromachining(EMM) process, International Journal of Advanced Manufacturing, 2010,(51)1:155–162(SCI:666SX)
18.Jinyou Shao, Yucheng Ding, Hongzhong Liu, Li Wang*, etal. Strategy for a loading force induced overlay position shift in step imprint lithography, Proc. IMechE, Part B: J. Engineering Manufacture,2009,1(223): 009-017(SCI:407MW)
19.Jinyou Shao, Hon gzhong Liu, Yucheng Ding,Li Wang*, etal. Alignment measurement method for imprint lithography using moiré fringe pattern, Optical Engineering, 2008, 11(47):113601(SCI:377RH)
20.Wang Li*, Lu B.H., Ding Y.C.,Qiu zhi-hui. etal. A Nano-scale Overlay Alignment Method for Imprint Lithograpy. Frontiers of Mechanical Engineering in China[J]. 2006, 1(2):157-161
21.Wang Li; Lu Bingheng; Ding Yucheng, etal. A Novel Two-Step Alignment Technique for Imprint Lithography, Acta Photonica Sinica, 2006, 35 (10):1608-1612
22.Wang Li*, Ding Y.C., Lu B.H., Li H.S. etal. Novel Nano-scale Overlay Alignment Method for Room-temperture Imprint Lithograpy. Semiconductor Photonics and Technology[J]. 2005, 11(42):275-288
23.Wang Li*, Lu B.H., Ding Y.C.,Qiu zhi-hui. etal. Novel nano-scale overlay alignment method for room-temperature imprint lithography. 2nd International Symposium on Advanced Optical Manufacturing and Testing Technologies - Advanced Optical Manufacturing and Testing Technologies, Nov 2-5 2005, Xian, SPIE[C], 2006,6149, 61491V-1- 61491V-6(EI:05219118838)
24.Wang Li, Lu Bingheng, Ding Yucheng, Liu Hongzhong, Ultra-precision alignment based on differential moiré tetechnique, Chinese Journal of Mechanical Engineering [J]. 2005,41(4): 75-78(EI:05219118838)
25.Wang Li*,Lu Bingheng,Cui Dongyin, etal; Ultra-Precision Alignment for Room- Temperature Multi-Layer Imprint Lithography, , Journal of Xi'an Jiaotong University [J], 2004, 38(9):895-899(EI:04508717300)
26.Wang Li*, Ding Y.C., Lu B.H., Li H.S. etal. Novel Nano-scale Overlay Alignment Method for Room-temperture Imprint Lithograpy. Semiconductor Photonics and Technology[J]. 2005, 11(42):275-288