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何成

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  • 博士生导师 硕士生导师
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  • 学历: 硕博连读
  • 学位: 博士
  • 学科: 材料科学与工程

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Interfacial Stability and Electronic Properties of Ag/M (M = Ni, Cu, W, and Pd) and Cu/Cr Interfaces

发布时间:2025-04-30
点击次数:
发布时间:
2025-04-30
论文名称:
Interfacial Stability and Electronic Properties of Ag/M (M = Ni, Cu, W, and Pd) and Cu/Cr Interfaces
发表刊物:
J Phys. Chem. C
摘要:
The work of separation (Wsep), interface energy (γint) and electronic properties of Ag/M (M=Ni, Cu, W and Pd) and Cu/Cr interfaces are studied systematically by using first-principles calculation. The results indicate that Ag(111)/Ni(111), Ag(100)/W(100) and Ag(111)/W(110) interfaces have comparatively large Wsep and low positive γint among all the interfaces, which demonstrates that the Ag/Ni and Ag/W interfaces are more suitable as interfaces of nano-multilayer electrical contact materials than Ag/Cu, Cu/Cr and Ag/Pd interfaces. Moreover, Ag(111)/Ni(111) interface has the largest quantum conductivity (G), ferromagnetic property and the best dispersing arc ability among these three interfaces, and thus it is the best candidate for the electrical contact materials.
合写作者:
C. He, M. Cheng, M. Zhang, and W. X. Zhang
卷号:
122, 17928−17935
页面范围:
122, 17928−17935
是否译文:
发表时间:
2018-08-01