何成
- 教授
- Supervisor of Doctorate Candidates
- Supervisor of Master's Candidates
- E-Mail:
- Date of Employment:2009-11-25
- Professional Title:教授
- Status:Employed
- Alma Mater:吉林大学
- College:School Of Materials Science And Engineering
- Discipline:Materials Science and Engineering
- Papers
Interfacial Stability and Electronic Properties of Ag/M (M = Ni, Cu, W, and Pd) and Cu/Cr Interfaces
Release Time:2025-04-30 Hits:
- Date:2025-04-30
- Title of Paper:Interfacial Stability and Electronic Properties of Ag/M (M = Ni, Cu, W, and Pd) and Cu/Cr Interfaces
- Journal:J Phys. Chem. C
- Summary:The work of separation (Wsep), interface energy (γint) and electronic properties of Ag/M (M=Ni, Cu, W and Pd) and Cu/Cr interfaces are studied systematically by using first-principles calculation. The results indicate that Ag(111)/Ni(111), Ag(100)/W(100) and Ag(111)/W(110) interfaces have comparatively large Wsep and low positive γint among all the interfaces, which demonstrates that the Ag/Ni and Ag/W interfaces are more suitable as interfaces of nano-multilayer electrical contact materials than Ag/Cu, Cu/Cr and Ag/Pd interfaces. Moreover, Ag(111)/Ni(111) interface has the largest quantum conductivity (G), ferromagnetic property and the best dispersing arc ability among these three interfaces, and thus it is the best candidate for the electrical contact materials.
- Co-author:C. He, M. Cheng, M. Zhang, and W. X. Zhang
- Volume:122, 17928−17935
- Page Number:122, 17928−17935
- Translation or Not:No
- Date of Publication:2018-08-01