Plasma Enhanced Complete Oxidation of Ultrathin Epitaxial Praseodymia Films on Si(111)
发布时间：2025-04-30
点击次数：
- 发布时间：
- 2025-04-30
- 论文名称：
- Plasma Enhanced Complete Oxidation of Ultrathin Epitaxial Praseodymia Films on Si(111)
- 发表刊物：
- Materials
- 摘要：
- Praseodymia films have been exposed to oxygen plasma at room temperature after deposition on Si(111) via molecular beam epitaxy. Different parameters as film thickness, exposure time and flux during plasma treatment have been varied to study their influence on the oxygen plasma oxidation process. The surface near regions have been investigated by means of X-ray photoelectron spectroscopy showing that the plasma treatment transforms the stoichiometry of the films from Pr2O3 to PrO2. Closer inspection of the bulk properties of the films by means of synchrotron radiation based X-ray reflectometry and diffraction confirms this transformation if the films are thicker than some critical thickness of 6 nm. The layer distance of these films is extremely small verifying the completeness of the plasma oxidation process. Thinner films, however, cannot be transformed completely. For all films, less oxidized very thin interlayers are detected by these experimental techniques.
- 合写作者：
- Olga Kuschel · Florian Dieck · Henrik Wilkens · [8th Gang Niu] ·
- 是否译文：
- 否
- 发表时间：
- 2015-09-18