ABSTRACT: Efficient transmission-type meta-holograms have been demonstrated using high-index dielectric nanostructures based on Huygens’ principle. It is crucial that the geometry size of building blocks needs to be judiciously optimized individually for spectral overlap of electric and magnetic dipoles. In contrast, reflection-type meta-holograms using the metal/insulator/metal scheme and geometric phase can be readily achieved with high efficiency and small thickness. However, the significant ohmic loss of the metal at short wavelength limits the operation of such metasurfaces to the near infrared regime. Here, we demonstrate a general platform for design of dual magnetic resonance-based meta-holograms based on the geometric phase using silicon nanostructures that are quarter wavelength thick for visible light. Significantly, the projected holographic image can be unambiguously observed without a receiving screen even under the illumination of natural light. With the facilitation of the well-developed semiconductor industry, our ultra-thin magnetic resonance-based meta-holograms may have promising applications in anti-counterfeiting and information security.