Numerical Simulation and Experimental Study on Resist Filling Behavior in UV-nanoimprint Lithography [J].
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Date:
2025-04-30Title of Paper:
Numerical Simulation and Experimental Study on Resist Filling Behavior in UV-nanoimprint Lithography [J].Journal:
Procedia CIRP,Summary:
Du J, Wei Z, Tang Y. Numerical Simulation and Experimental Study on Resist Filling Behavior in UV-nanoimprint Lithography [J]. Procedia CIRP, 2012, 3 (0): 203-208. （SCI:BDS14, EI: 20124415618267）Co-author:
Du J, Wei Z, Tang Y.Volume:
2012, 3 (0)Page Number:
: 203-208.Translation or Not:
NoDate of Publication:
2012-03-19