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中文
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Research
Research Field
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Patents
一种新型复合磁场触头结构及其应用的真空灭弧室
Release Time:2025-04-30
Hits:
Title:
一种新型复合磁场触头结构及其应用的真空灭弧室
Disigner of the Invention:
ZL 201510394330.8
Type of Patent:
Invent
Application Number:
ZL 201510394330.8
Service Invention or Not:
No
Application Date:
2016-04-13
Date:
2025-04-30
Prev One:
适用于容性电流开断的真空灭弧室复合触头结构及灭弧室
Next One:
一种带有固定断口的真空灭弧室
Patents
