赵万华
- 教授
- Supervisor of Doctorate Candidates
- Supervisor of Master's Candidates
- E-Mail:
- Date of Employment:1986-07-01
- Education Level:With Certificate of Graduation for Doctorate Study
- Professional Title:教授
- Status:Employed
- Alma Mater:西安交通大学
- College:School Of Mechanical Engineering
- Discipline:Mechanical Engineering
- Papers
Novel Stereolithographu System for Small Size Objects
Release Time:2025-04-30 Hits:
- Date:2025-04-30
- Title of Paper:Novel Stereolithographu System for Small Size Objects
- Journal:Rapid Prototyping Joural
- Summary:Purpose – To satisfy the demands for rapid prototyped small-size objects with intricate microstructures, a high-resolution stereolithography (SL) system is developed.
Design/methodology/approach – This novel SL system consists of a single mode He-Cd laser, an improved optical scanning system, a novel recoating system and a control system. The improved optical system consists of a beam expander, an acoustic-optic modulator, a galvanometric scanner and an F- lens; the recoating system consists of roller pump, resins vat with an integrated high-resolution translation stage and part building platform and a scraper. Experimental studies were performed to investigate the influences of building parameters on the cured line width and depth.
Findings – With the SL system, a laser light spot with a diameter of 12.89?µm on the focal plane and resin layers with a thickness of 20?µm have been obtained. The experimental results indicate that cured depth and width increase with the ratio of laser power to scanning speed, and cured line with a width of 12?µm and a depth of 28?µm was built, which showed the capability building microstructures with this new SL system.
Research limitations/implications – The building area limited to 65?×?65?mm, is smaller than that of current SL system.
Practical implications – Small objects with intricate microstructures can be fabricated with the SL system.
Originality/value – The high-resolution SL system provides a solution to the problem that has hampered the progress of SL process into a high resolution ranges below 75?µm. - Co-author:Xu Guangshen,Zhao Wanhua等
- Translation or Not:No
- Date of Publication:2006-01-21
