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中文
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Research
Research Field
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Patents
Publications
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Teaching
Teaching Resources
Teaching Information
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Papers
Alignment measurement method for imprint lithography using moiré fringe pattern
Release Time:2025-04-30
Hits:
Date:
2025-04-30
Title of Paper:
Alignment measurement method for imprint lithography using moiré fringe pattern
Journal:
Optical Engineering
Co-author:
Jinyou Shao, Hon gzhong Liu, Yucheng Ding,Li Wang
Translation or Not:
No
Date of Publication:
2008-11-01
Prev One:
Strategy for a loading force induced overlay position shift in step imprint lithography