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Extreme strain rate and temperature dependence of the mechanical properties of nano silicon nitride thin layers in a basal plane under tension: a molecular dynamics study
发布时间：2025-04-30
点击次数：
- 发布时间：
- 2025-04-30
- 论文名称：
- Extreme strain rate and temperature dependence of the mechanical properties of nano silicon nitride thin layers in a basal plane under tension: a molecular dynamics study
- 发表刊物：
- 《Physical Chemistry Chemical Physics》（中科院 2区）
- 摘要：
- Molecular dynamics simulations are performed to clarify the extreme strain rate and temperature dependence of the mechanical behaviors of nano silicon nitride thin layers in a basal plane under tension. It is found that fracture stresses show almost no change with increasing strain rate. However, fracture strains decrease gradually due to the appearance of additional N2c–Si bond breaking defects in the deformation process. With increasing loading temperature, there is a noticeable drop in fracture stress and fracture strain. In the low temperature range, roughness phases can be observed owing to a combination of factors such as configuration evolution and energy change.
- 合写作者：
- Xuefeng Lu a, Hongjie Wang *a, Yin Wei a, Jiangbo Wen a, Min Niu a ,Shuhai Jia*
- 卷号：
- 2014 , 16 (29)
- 是否译文：
- 否
- 发表时间：
- 2014-03-31
